Equipment/Instrumentation

Please find a comprehensive catalogue of the Singh Center’s high-performance equipment for nanotechnology research, easily accessible to faculty, staff and researchers.
View our reservation system for availability information

Facility Fees

Singh Facilities Charges

Internal and External Academic Users

External Industry Users

Quattrone Nanofabrication Facility
Main Clean Room
Door Charge $35/hr $70/hr
Equipment Charges Range $15/hr to $50/hr Range $45/hr to $150/hr
Cap – Lab Access Yes, $500/month/user No
Cap – Equipment Use Yes, $500/month/user No
Staff Rates $50 $80
Soft Litho Facility
Door Charge $15/hr $45/hr
Equipment Charges Range $15/hr to $25/hr Range $45/hr to $75/hr
Cap – Lab Access Yes, $500/month/user No
Cap – Equipment Use Yes, $500/month/user No
Staff Rates $50 $80
Nanoscale Characterization Facility
Equipment Charges Range $35/hr to $50/hr Range $210/hr to $300/hr
Staff Rates $50 $100
Scanning Probe Facility
Equipment Charges Range $30/hr-$35/hr Range $125/hr to $200/hr
Staff Rates $50 $75

Quattrone Nanofabrication Equipment / Instrumentation

Soft Lithography

 

Anatech SCE 106

Anatech USA’s SCE-100 Series Inductively Coupled (ICP) Plasma systems are extremely effective for a Plasma Ashing process to activate a surface prior to bonding PDMS, e.g.

Process gases is O2. Sample sizes are pieces to 100mm round wafers.

Go to Page

 

AMB 3000HR Mask Aligner

The 3000HR series Mask Aligner is high resolution, Contact/Proximity Aligner. The system offers precise and repeatable sub-micron alignment and exposure for many wafer and substrate sizes. This includes sensitive, brittle and odd shaped materials. The precision wedge-error compensation vacuum chucks offer consistent mask to substrate planarization for accurate separation adjustment and ease of alignment.

Specifications:

  • 350 Watt UV Exposure System with Intensity Controlling Power Supply
  • 365 nm Output Intensity – Approximately 20-25 mW/cm²
  • 400 nm Output Intensity – Approximately 40-50 mW/cm²
  • Uniform/Collimated Beam Size: 5.0″ Diameter
  • Beam Uniformity: ± 3-5%
  • Adjustable Expose Timer: Adjustable from .1 to 999.9 Seconds
  • Nikon Single Field Binocular Microscope with 5x, 10x, & 20x Objectives, 10x Eyepieces, including Adjustable Coaxial Illuminator.
  • Stationary Mask Alignment Module with X,Y,Z, and Theta Motion
  • Electronic/Pneumatic Operator Control Panel
  • Top Load Vacuum Holders for 4” x 4 and ”5” x 5” Masks
  • Planarizing Vacuum Chuck for Piece Parts (up to 1” Diameter) & 4” Wafers
  • Z axis Adjustment: ±750 µm
  • Mask-to-Substrate Separation: settable in 10 µm increments
  • Front-side Alignment Accuracy: < 0.5 µ

Printing Resolution: Near UV < 0.8µm

Go to Page

 

SU-8/PDMS Resist Spinner

  • Maximum speed of 10,000 rpm
  • User friendly programmable interface
  • Programmable step functions (up to 10 steps per recipe)
  • Programmable process control
  • Wafer sizes from pieces through 150mm
Go to Page

 

Vacuum Oven

Vacuum oven capable of reaching ~10 Torr with digital gravity convection for curing samples from 25-250C

Go to Page

 

PDMS Process Bench

  • Substrates up to 150mm
  • Solvent develop and PDMS mixing station
Go to Page

Nanoscale Characterization Equipment / Instrumentation

Scanning and Local Probe Equipment / Instrumentation

 

Agilent AFM

Range

  • 90μm ✕ 90 μm ✕ 7 μm closed-loop scanner
  • 9 μm ✕ 9 μm ✕ 2 μm open loop scanner

Noise floor

  • <5 Å (large scanner)
  • <1 Å (small scanner)

Controller

  • Ten 16-bit channels input
  • Four 24-bit channels out

Modes

  • Contact, tapping, lateral force, force spectroscopy, SKPM, MAC and Top MAC

Environment

  • Ambient, purged gas, fluid

 

Applications: Controlled-environment AFM (fluid, purged gas, temperature- programmed). Polymers, electrochemistry, force spectroscopy. Magnetically- excited AFM.

Go to Page

 

Asylum AFM

Modes available

  • Contact, AC (tapping) and Dual AC, 1-D forces, lateral force, nanolithography, Electrostatic Force, Kelvin probe, conductive AFM, Magnetic Force, piezoelectric force, thermal AFM

Scan axes

  • 90μm x 90μm ✕ 15μm closed loop

Z noise

  • <0.06nm 0.1Hz-1kHz BW

Cantilever noise

  • <0.02nm Adev, 0.1Hz-1kHz BW.

Analog to Digital Converters

  • One 16-bit, 5 MHz channel

Digital to Analog Converters

  • Five 16-bit 100kHz channel

Direct Digital Synthesizer

  • Six 24-bit 100kHz channels, plus two 10-bit 10MHz summed on a singleDAC

Applications: Force curves in contact or AC modes, frictional force imaging. Nanolithography, electrostatic force microscopy, and scanning surface potential. Conductive AFM, magnetic and piezoresponse force microscopy.

Go to Page

 

Bruker Icon AFM

X-Y scan range

  • 90μm × 90 μm × 10 μm

Vertical noise floor

  • <30 pm RMS

Current sensitivity

  • pA to μA

Motorized position stage (X-Y axis)

  • 180mm × 150mm
  • 210mm vacuum chuck

AFM modes

  • PeakForce (with quantitative nanomechanics), tapping, contact, lateral force, magnetic force spectroscopy, Kelvin probe, conductive AFM, tunneling AFM, electrostatic force, magnetic force, piezoelectric force, torsional resonance mode.

Applications: Nano-mechanics, whole-wafer inspection, scanning conductivity/resistance microscopy. Electrical measurements of soft materials.

Go to Page

 

HV STM

Omicron STM-1 scanner

  • 2 μm XY range
  • 20-50 pA min current

RHK SPM 1000 controller

  • 10 channel input
  • 26-bit resolution
  • complete signal access

Vacuum capability

  • 10-8 mtorr

Accessories

  • LEED, sample annealing, lockin amplifiers, optical excitation

Applications: Atomically resolved imaging, density of states/bandgap analysis, photon-stimulated electrical properties, and nano-gap electrodes

Go to Page

 

Probe Station

Probe arms

  • 4 ✕ 0-1GHz
  • 2 ✕ 1-20 GHz

Vacuum

  • 10-6 torr

Lockin amplifiers

  • SRS 830, SRS 844

Impedance analyzer

Agilent E5061B 5Hz-3GHz

Network analyzer

  • Agilent N5230C 10MHz-20GHz

Temperature Range

  • LHe-50 °C

Electrometer

  • Kiethley 6517A

Function generators

  • SRS DS345 30MHz

Programming interface

  • Labview

Applications: Conductance, resistance, impedance, capacitance measurements of circuits, devices, and resonators.

Go to Page

 

Raman-NSOM

AFM scanners

  • 1μm, 10μm, and 100μm XY range
  • 532 and 660 nm laser sources

Optical heads

  • 7 NA 100 x upright air lens
  • 3 NA 100 x inverted

Confocal Raman

  • Adjustable pinhole size and objective lens alignment

Spectrometer

  • 1800, 600, and 150/mm gratings and 75/mm Echele. Cooled CCD/EMCCD detector.

AFM modes

  • Contact, tapping, force mapping, Kelvin probe, conductive AFM, lateral force. Tuning fork AFM allows custom-cut and etched metal probes.

Environmental control

  • Enclosures for each scanner for gas purge. Heated sample stage, fluid cell.

Simultaneous AFM/Raman

  • Keeps samples of varying topography in focus

Near Field Scanning Optical Microscopy (NSOM)

  • AFM-aperture optical microscopy is available in transmission mode

Applications: Simultaneous chemical and topographic/mechanical analysis. In situ temperature measurement. AFM-aperture optical microscopy. Optical devices such as semiconductor lasers, waveguides, and plasmonic devices Investigation of cellular tissue, DNA, viruses and other biological objects. Nanotubes, nanowires, and quantum dots.

Go to Page

 

TIRF

Modes available

  • Contact, AC (tapping) and dual AC, 1-D forces, lateral force, nanolithography, electrostatic force, Kelvin probe, conductive AFM, magnetic force, piezoelectric force, thermal AFM

Scan axes

  • 90μm ✕ 90μm ✕15 μm closed loop

Z noise

  • <0.06nm 0.1Hz-1kHz BW

Cantilever noise

  • <0.02nm Adev, 0.1Hz-1kHz BW

Accessories

  • Micromanipulator, nano-injector, temperature-controlled chamber

Bio prep-space

  • CO2 incubator, Bio-safety cabinet

Optics

  • 641, 532, 488 nm lasers
  • Cascade II EMCCD camera with dual view filter
  • Nikon inverted optical microscope
  • 10✕, 40✕, 100 ✕ objectives

Applications: Mechanics of cells, tissues, and polymers. Tagging and identification of cells, proteins, and molecules. Controlled dosing of samples via micropipette. Controlled environment (fluid, temperature) experiments.

Go to Page

 

UHV VT AFM

Scan range

  • 10 μm x 10 μm x 1.5 μm

Z – resolution 0.01 nm

  • 01 nm

Tunneling current:

  • < 1pA – 330 nA

Gap voltage

  • ± 5 mV to ± 10 V; applied to tip/cantilever, sample grounded

Vacuum achievable:

  • 10-11 mbar or better

Sample size

  • 3mm x 9mm 7mm diameter

Temp range

  • 100K – 1500 K

Imaging modes

  • Contact, tapping, and FM noncontact

Accessories

  • LEED, Auger electron spectroscopy
  • Evaporator, leak valves for controlled gas environment, sputter gun

Controller

  • 20-bit, <25μV noise @ 60kHz up to 24 data acquisition signals

Applications: Atomically-resolved imaging of surfaces. Surface reconstruction. Friction and adhesion measurements. Surface potential and conductive AFM. Scanning Gate Microscopy. Scanning Kelvin Probe + Local dielectric AFM.

Go to Page

Property Measurement Group / Instrumentation

This is the first of two PPMS systems in the facility. It provides magnetic field up to 9 T and temperatures from 1.7 K to 400 K. Users are able to perform DC magnetic moment, AC magnetic susceptibility, 2- and 4-wire magnetoresistance, photoconductivity, and Hall effect.

This system benefits from the PPMS EverCool-II™ dewar, which is the second generation of low-loss dewars with integrated Helium liquefier for the PPMS system from Quantum Design. It allows the continuous operation of the PPMS System without the supply with liquid Helium. The system is cryogen free for the user, and can hold temperatures below 2 K indefinitely.

 

Go to Page

This is second of two PPMS systems in the facility. It provides magnetic field up to 9 T and temperatures from 1.7 K to 400 K. Users are able to perform 2- and 4-wire magnetoresistance, thermal conductivity, heat capacity, Seebeck coefficient, and Hall effect measurements. The system is equipped with a turbo pump for the sample chamber.

Go to Page

Quantum Design’s MPMS-XL provides sensitive SQUID (Superconducting QUantum Interference Device) magnetometry capabilities using Quantum Design’s Reciprocating Sample Option (RSO). In practice, we observe a noise floor of <10-8 emu for DC moment measurements. The system provides magnetic fields up to 7 Tesla and temperatures nominally between 2 K and 400 K. The MPMS has a fiber insert that permits studies of optically pumped magnetization, and an oven option that allows measurements up to 800 K when special needs arise.

MPMS XL Features

  • Cryogen Free with EverCool®
  • SQUID Sensitivity
  • Multiple Measurement Modes
    (Including Traditional MPMS DC Scan)
  • Temperature Range: 1.8 – 400K
  • 7 Tesla Magnet

 

Go to Page

The TriVista system is a triple spectrometer that has multiple input and detection ports that we can configure to provide Raman scattering down to 5 cm-1, photoluminescence excitation/emission spectral mapping, absorption, as well as spatial imaging of Raman scattering or photoluminescence with an infinitely tunable (in width and center wavelength) bandpass filter from 350 nm to 1000 nm. For Raman scattering, the system can operate in either additive mode for high resolution experiments or in subtractive mode for extreme stray light rejection. The system has both Si and InGaAs detectors, providing detection bandwidth from 350 nm to 1.7 microns. Light sources include a Xenon lamp (from which any spectral range can be selected without altering the illumination profile) and a laser at 532 nm. We are able to measure samples on solid substrates and liquids within cuvettes.

Instrumentation

  • Princeton Instruments Tri-Vista 555 spectrometer (9 gratings)
  • Princeton Instruments PIXIS-256E Si 2D array detector
  • Princeton Instruments OMA-V InGaAs linear array detector
  • Custom Optical Systems for Absorbance, Photoluminescence and Raman Scattering.
Go to Page