Equipment/Instrumentation

Anatech SCE-106

 

Anatech SCE 106

Anatech USA’s SCE-100 Series Inductively Coupled (ICP) Plasma systems are extremely effective for a Plasma Ashing process to activate a surface prior to bonding PDMS, e.g.

Process gases is O2. Sample sizes are pieces to 100mm round wafers.

Anatech SCE-106