Nanoscale Characterization Equipment / Instrumentation
JEOL 7500F HRSEM
The JEOL 7500F Scanning Electron Microscope provides ultrahigh resolution of 0.8 nm at 30 kV and 1 nm at 1 kV, which is particularly useful for soft-matter studies. The JEOL 7500F SEM is our dedicated conventional and high-resolution imaging microscope. It is equipped with multiple detectors and imaging modes that allow for the study of a wide range of solid materials. Secondary and backscattered electron detectors allow for imaging of sample surfaces, whereas a scanning-transmission electron detector shows the internal structure of materials. Through a stage biasing system, referred to as the “gentle-beam” mode, the electron beam interacting with the sample may be reduced to a fraction of the accelerating voltage of the gun, allowing for the imaging of soft or insulating samples without the need for carbon or metal coating.Go to Page
Quanta 600 FEG ESEM
An FEI Quanta 600 FEG Mark II Environmental Scanning Electron Microscope achieves 1.5 nm resolution in ESEM mode and can be operated under a range of gaseous environments from 6 x 10-4 Pa to ~1000 Pa. It is equipped with a special wet STEM detector that is ideal for the imaging of nanoparticles in biological systems. This system is our platform for in-situ electron microscopy development with heating and cooling stages allowing imaging from 20-1000°C, dual Kleindiek nano-manipulators with a micro-droplet injection system for electrical and mechanical measurements, and gas injection systems for platinum and gold e-beam deposition. The Quanta SEM is equipped with a unique array of accessories to enable the combination of high-resolution imaging and nanoscale manipulation allowing for powerful in-situ experiments involving controlled stimuli and correlated response. In-situ capabilities include: nanoscale manipulation of specimen or probe, access to the large sample volume by fluids, gases, electrical, optical and mechanical probes; detection of sample response to such probes, including the electron beam itself; and the temperature dependences of all these phenomena.Go to Page
TESCAN S8000X FIB/SEM
The TESCAN S8000X is a versatile instrument for the characterization of materials. It combines a plasma-source focused ion beam microscope and a high- resolution (BrightBeam) scanning electron microscope. The FIB microscope is equipped with a Xe+ ion plasma source and will include additional gases in the near future. The Xe plasma can generate a focused beam up to 1 uA, which allows very high milling rates (up to 50X faster than the pior Ga+ ion technology) and does not lead to deliterous ion implantation in the same way that Ga+ ions do. The BrightBeam SEM is a field-free, ultra-high resolution electron microscope whose optics allow improved resolution, even at low energies. This improves imaging of non-conducting samples. The instrument is equipped with advanced analytical capabilities, as well. These include a Time-of-Flight Secondary Ion Mass Spectrometery (ToF-SIMS) that can detect the ions emitted from the sample, allowing chemical characterization. ToF-SIMS is especially useful in detecting light elements, including the discrimination of hydrogen and deuterium. An Energy Dispersive x-ray spectrometer allows for additional, complementary chemical characterization. The S8000X is also equipped with a cryogenic stage and a sample transfer loadlock, allowing work down to -160 C or introduction of frozen samples into the tool to be milled. A cryogenic Kleindiek nanomanipulator enables users to interact with the sample in-situ as well as lift-out frozen sections for subsequent TEM analysis.
This instrument was purchased with support from a National Science Foundations’ Major Research Instrumentation grant (NSF MRI #1828545). Additional support from the Laboratory for Research on the Structure of Matter (University of Pennsylvania Materials Research Science and Engineering Center (MRSEC) (DMR-1720530).Go to Page
The JEOL NEOARM is a scanning / transmission electron microscope, equipped with a spherical aberration corrector for the probe-forming optics. This corrector has improved stability and optimizes 5th order aberrations, leading to an as-installed resolution of <0.63Å at 200kV, and a <1.92Å at 30kV. The instrument is a high-brightness cold field emission instrument. It is equipped with two large area energy dispersive x-ray spectrometers that permit rapid atomic-resolution EDS mapping. It is equipped with a Gatan Image Filter, incorporating DualEELS capability to ensure accurate energy calibration and a K2-IS direct electron detector at the end of the filter. This detector has a detection quantum efficiency that is close to 1.0, and thus allows high sensitivity, leading to the detection of very high energy losses. The detector also allows 2k x 2k image acquisitions at 400 frames/second, and 512k x 2k image acquisitions at 1600 frames/second, making it optimal for in-situ/operando microscopy. This JEOL NEOARM was the first to be installed in the U.S.
For more information: https://www.
The JEOL F200 is a 200kV scanning / transmission electron microscope with a cold field emission source, two large area energy dispersive x-ray spectrometers, and Gatan OneView IS camera for in situ/operando imaging at 30 frames per second. It incorporates STEMx capability.
The ThermoFisher Krios is a dedicated cryo-EM, with an autoloader for high through-put sample observation and a Gatan BioQuantum electron energy loss spectrometer equipped with a K2 Summit direct electron detector. The cryo-EM is installed in a facility constructed to ensure an ultra-low humidity space for both the instrument and the associated sample preparation areas. The cryogenic sample preparation laboratories include facilities for cryo-plunge sample preparation, high-pressure freezing, and cryo-ultramicrotomy.
For more information: https://www.fei.
NEC Mini-Tandem 5.1 MeV Ion Accelerator
Thin film characterization is carried out in the NCF’s Ion Scattering Laboratory, located in the Laboratory for Research on the Structure of Matter. At the heart of this laboratory is an NEC 5SDH 1.7MV Pelletron Accelerator, which is capable of producing ion beams ranging from 0.2-5.1 MeV. The laboratory maintains a beam line and end station for Rutherford Backscattering, Particle Induced X-ray Emission and Forward Recoil Spectrometry and ion implantation. A computer-controlled goniometer aids in the collection of channel maps for crystal structure orientation studies and ion implantation applications.Go to Page