Equipment/Instrumentation

Heidelberg DWL 66+

 

Heidelberg DWL 66+

The DWL 66+ laser lithography system is a high resolution pattern generator for low volume mask making and direct writing. The capabilities and flexibility of this system make it the ultimate lithographic research tool in Life Science, Advanced Packaging, MEMS, Micro-Optics, Semiconductor and all other applications that require microstructures.
Specifications
Laser Power: 250 mW
Laser Wavelength: 355 nm
Minimum line width: 2 mm write head
Specimen size 7″ mask (maximum)
Available write heads: 2 mm, 10 mm and 40 mm
Heidelberg DWL 66+