Equipment/Instrumentation

Kurt J. Lesker PVD 75 PRO-Line Sputterer

Kurt J. Lesker PVD 75 PRO-Line Sputterer

  • Load locked system
  • Three DC guns
  • Able to co-sputter two DC sources
  • One RF gun
  • Cryo pumped with automated interface
  • Automated control of film thickness
  • Pieces through 150mm wafers
  • Wafer platen rotation with heating
Kurt J. Lesker PVD 75 PRO-Line Sputterer