Equipment/Instrumentation

MRL Cyclone Atmospheric and LPCVD Furnace

 

MRL Cyclone Atmospheric and LPCVD Furnace

  • 4-Stack Tube Furnace
    • Thermal Oxidation (wet/dry)
    • LPCVD Silicon Nitride
    • (2) Atmospheric anneal: N2, forming gas
  • Up to 150 mm substrates
  • 50 wafer processing flat zone

 

MRL Cyclone Atmospheric and LPCVD Furnace