Equipment/Instrumentation

Beamer and Tracer Lithography Software

Beamer and Tracer Lithography Software

TOOL ID: EBL-02

The Quattrone Nanofabrication Facility (QNF) features state of the art software for next generation electron beam (e-beam), mask aligner and laser lithography. Specifically, the software package, BEAMER and TRACER, offers advanced data preparation, 2D and 3D proximity effect correction (PEC), process modeling and simulation for direct write applications in both e-beam and laser lithography.

Beamer and Tracer Lithography Software