E-Beam Resist Spin & Develop Bench
Reynolds Tech E-Beam Resist Spin & Develop Bench
This is a laminar flow bench containing one spinner with rotation speeds from 1-10,000 RPM. Wafer sizes from pieces to 150mm. Solvent drains and nitrogen guns at each spinner station. This bench is also used for e-beam resist development. Standard PMMA and ZEP 520A are provided.