Positive Photoresist Spinner Bench
Reynolds Tech Positive Photoresist Spinner Bench
This is a laminar flow bench with three spinners with rotation speeds from 1-10,000 RPM. Wafer sizes from pieces to 150mm. Solvent drains and nitrogen guns at each spinner station.
![](https://www.nano.upenn.edu/wp-content/uploads/2017/09/WB-01v2-225x300.jpg)
Positive Photoresist Spinner Bench