Advances in Micro- and Nanoscale Etching for Novel Electronic, Photonic, and Quantum Based Devices
April 21-22, 2022
This 2-day symposium will include an internal meeting of NNCI technical staff and invited non-NNCI staff on the first day, April 21. Member NNCI sites are invited to give updates on new etch equipment and newly developed etch processes. A portion of the first day will be dedicated to an open discussion of any etch related equipment or process issues you may have. In addition, we have invited etch equipment vendors including Oxford Instruments, Plasmatherm, SPTS, and others to give technical presentations to highlight their latest developments in etch processes such as atomic layer etching (ALE) and those processes critical for electronic, photonic, and quantum-based devices. The vendors will also have exhibit booths available so that attendees can meet and discuss the manufacturers’ most recent etch product and ancillary equipment offerings.
Day One Agenda – Thursday, April 21, 2022 – Location – Singh Center for Nanotechnology
|ALE for low loss Quantum devices
|UPenn Site Update
|Cornell Site Update
|Low Temperature Plasma Technology for Advanced Packaging Applications
|Harvard Site Update
|Stanford Site Update
|Minnesota Site Update
|Endpoint detection for Plasma Etching
|Georgia Tech Site Update
|USCD Site Update
|UNC Site Update
|Washington Site Update
Day 2, April 22, will be an open public event with invited and contributed talks by experts from academic and government labs. The topics will discuss etching aspects in a broad range of nanotechnology, including quantum and nanophotonic device fabrication to the role of artificial intelligence (AI) in the fab.
Day Two Agenda – Friday, April 22, 2022 – Location – Houston Hall – Golkin Room –
University of Pennsylvania
|Quantum Applications Build on Creative Nanofabrication
|Penn State University
|Fabrication of Si, Si3N4, and InGaP Optical Metasurfaces with Dry Etching
|Faster and Lower-Power Photonic Solutions via Thin-Film Lithium Niobate
|University of California-Santa Barbara
|Ru Hard Masked SiO2 Etching
|Role of Artificial Intelligence in Etching
|LiNbO3 Nanophotonic Platform for Nonlinear Optics
|Quantum & Non-linear Photonics in SiC
|Photonic Waveguides and Acousto-optic Devices on AlN
|University of Pennsylvania
|Etching of AIScN Materials
REQUIREMENTS FOR ATTENDING
The health and safety of the community is our primary concern. If you are attending in person, the University of Pennsylvania requires each attendee to be fully vaccinated and be ready to show proof of vaccination upon request.
All attendees will be required to complete the PennOpen Pass using their phone (https://pennopen.med.upenn.edu/). In the event of contact tracing, your contact information may be shared with the University or any other responsible entities. For more information about the University of Pennsylvania’s COVID-19 policies, please review its Public Health Guidance.
As of April 18, 2022, all members of and visitors to the Penn community will be required to wear masks while indoors in public or shared spaces.
There are several hotels located within a three-block walking distance to the Singh Center for Nanotechnology and Houston Hall, on the University of Pennsylvania Campus.
A block of 20 rooms have been reserved at Sheraton Philadelphia University City Hotel (36th and Chestnut). Please use this link to reserve your room from this block. They have also made the Tuesday night and Friday night available at the special rate.
In addition, other hotels in walking distance to the Singh Center for Nanotechnology are:
The National Nanotechnology Coordinated Infrastructure (NNCI) is an NSF-sponsored network of 16 sites involving nearly 30 university shared research facilities across the USA (https://www.nnci.net). The NNCI organizes network-wide events to bring together technical experts in a particular fabrication discipline. A principal objective of this symposium is to bring together etch personnel in an interactive forum where collective knowledge on etch processes and equipment can be shared.