Focused Ion Beam microscope
The Tescan S8252X is a dual-beam plasma focused ion beam scanning electron microscope (FIB-SEM) equipped with a variable gas plasma ion source, a time-of-flight secondary ion mass spectrometer (ToF-SIMS), an energy-dispersive x-ray spectrometer (EDS), a cryogenic stage and sample transfer, and a Kleindiek cryogenic nanomanipulator. All of these features enable researchers to perform highly site-specific imaging, materials analysis through x-ray and molecular fragment signals, and sample lift-out for subsequent TEM analysis over a wide temperature range and for a wide variety of samples. The variable gas plasma ion source allows researchers the flexibility to tune the incident ions to best meet their needs—Xenon is preferred for large-area milling on metals while Oxygen is preferred for biological and soft materials. The cryogenic stage and sample transfer mechanism allows researchers to work on frozen or temperature-sensitive samples without melting.