Equipment/Instrumentation

Negative Photoresist Develop Bench

Reynolds Tech Negative Photoresist Develop Bench

This is a negative photoresist developing bench with integrated single wafer rinsing for samples up to 150mm. Typical developers PGMEA based for SU-8. Another application is use of resist strippers that can be disposed in the integrated solvent drains.

Negative Photoresist Develop Bench