Negative Photoresist Develop Bench
Reynolds Tech Negative Photoresist Develop Bench
This is a negative photoresist developing bench with integrated single wafer rinsing for samples up to 150mm. Typical developers PGMEA based for SU-8. Another application is use of resist strippers that can be disposed in the integrated solvent drains.
![](https://www.nano.upenn.edu/wp-content/uploads/2017/09/WB-04v2-225x300.jpg)
Negative Photoresist Develop Bench