Negative Photoresist Spinner Bench
Reynolds Tech Negative Photoresist Spinner Bench
This is a laminar flow bench with two spinners with rotation speeds from 1-10,000 RPM. Wafer sizes from pieces to 150mm. Solvent drains and nitrogen guns at each spinner station. PDMS can be spun in one of the spin station; the other station is typically used for SU-8, LOR and related negative resists.
Negative Photoresist Spinner Bench
