Zeiss ORION NanoFab
The Zeiss ORION NanoFab focused ion beam (FIB) microscope is an ultrahigh-resolution imaging, direct writing, and lithography platform that operates with either He or Ne. The He beam has a ~0.5 nm probe and produces sub-5 nm resolution images and patterns with large depth of field. The Ne beam is used for direct write and lithography applications between 10 and 100 nm. Non-conductive samples can be imaged with the aid of an electron flood gun.